Details der Publikation - Colloidal lithography-based fabrication of suspended nanoporous silicon nitride membranes

Colloidal lithography-based fabrication of suspended nanoporous silicon nitride membranes

Abstract Nanoporous membranes provide a basis for constructing non-supported biomembranes, which enable biological processes such as ion and molecule transport through the biomembranes to be investigated under physiological conditions with ease of control. Preparation of such membranes usually requires expensive equipments and extensive experiences. In this paper, we provide a cheap and controllable scheme of high volume fabricating suspended nanoporous $ Si_{3} $$ N_{4} $ membranes on a Si wafer by combined colloidal lithography and standard Si fabrication technology including low cost ICP etching and anisotropic Si wet-etch. $ Si_{3} $$ N_{4} $ layers are grown on Si wafers. Polystyrene particles of 200-nm-diameter are then monodispersed on the $ Si_{3} $$ N_{4} $ layers based on electrostatic repulsions with an average density of 2%. This is followed by Cr masking, ICP etching and Si wet-etch processes to form suspended $ Si_{3} $$ N_{4} $ membranes with 200-nm-deep nanopores through the membranes. The well-aligned cylindrical nanopores have a low aspect radio of ca. 0.9, which would be beneficial to forming stable suspended lipid bilayers..

Medienart:	E-Artikel

Erscheinungsjahr:	2009
Erschienen:	2009

Enthalten in:	Zur Gesamtaufnahme - volume:167
Enthalten in:	Microchimica acta - 167(2009), 1-2 vom: 04. Okt.

Sprache:	Englisch

Beteiligte Personen:	Zhang, Xuan [VerfasserIn] Zhu, Zaiwen [VerfasserIn] Sun, Chunfeng [VerfasserIn] Zhu, Feng [VerfasserIn] Luo, Zhongzi [VerfasserIn] Yan, Jiawei [VerfasserIn] Mao, Bingwei [VerfasserIn]

Links:	Volltext [lizenzpflichtig]

BKL:	35.00$jChemie: Allgemeines
Themen:	Biosensor Colloidal lithography Nanopores Silicon nitride suspended membranes

Anmerkungen:	© Springer-Verlag 2009

doi:	10.1007/s00604-009-0216-5

funding:
Förderinstitution / Projekttitel:

PPN (Katalog-ID):	OLC2107647356

Internformat


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520			\|a Abstract Nanoporous membranes provide a basis for constructing non-supported biomembranes, which enable biological processes such as ion and molecule transport through the biomembranes to be investigated under physiological conditions with ease of control. Preparation of such membranes usually requires expensive equipments and extensive experiences. In this paper, we provide a cheap and controllable scheme of high volume fabricating suspended nanoporous $ Si_{3} $$ N_{4} $ membranes on a Si wafer by combined colloidal lithography and standard Si fabrication technology including low cost ICP etching and anisotropic Si wet-etch. $ Si_{3} $$ N_{4} $ layers are grown on Si wafers. Polystyrene particles of 200-nm-diameter are then monodispersed on the $ Si_{3} $$ N_{4} $ layers based on electrostatic repulsions with an average density of 2%. This is followed by Cr masking, ICP etching and Si wet-etch processes to form suspended $ Si_{3} $$ N_{4} $ membranes with 200-nm-deep nanopores through the membranes. The well-aligned cylindrical nanopores have a low aspect radio of ca. 0.9, which would be beneficial to forming stable suspended lipid bilayers.
650		4	\|a Nanopores
650		4	\|a Silicon nitride suspended membranes
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650		4	\|a Biosensor
700	1		\|a Zhu, Zaiwen \|4 aut
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700	1		\|a Yan, Jiawei \|4 aut
700	1		\|a Mao, Bingwei \|4 aut
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Colloidal lithography-based fabrication of suspended nanoporous silicon nitride membranes

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