Catalytic Oxidation of Dimethyl Sulfide Over Commercial V-W/Ti Catalysts: Plasma Activation at Low Temperatures
This paper investigated the enhancement of plasma on dimethyl sulfide (DMS) removal over commercial V-W/Ti catalysts. The effects of catalyst composition, discharge power, and gas temperature on DMS removal in the plasma-based system were analyzed. The results showed that the V 0.9 -W/Ti catalyst exhibited the best performance toward DMS removal due to its highest reducibility among the employed samples. The introduction of plasma exhibited a synergistic effect on catalysts and significantly enhanced the removal of DMS over the studied temperature range, especially in high discharge power cases. The activation energy <inline-formula> <tex-math notation="LaTeX">E_{a} </tex-math></inline-formula> of DMS removal in the presence of plasma was dramatically reduced to less than 10% of the catalysis only case, indicating different DMS removal pathways in plasma-activated catalysis system. The reaction mechanisms of DMS were also discussed based on the reaction products..
| Medienart: |
Artikel |
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| Erscheinungsjahr: |
2016 |
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| Erschienen: |
2016 |
| Enthalten in: |
Zur Gesamtaufnahme - volume:44 |
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| Enthalten in: |
IEEE transactions on plasma science - 44(2016), 12, Seite 3379-3385 |
| Sprache: |
Englisch |
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| Beteiligte Personen: |
Zhu, Xinbo [VerfasserIn] |
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| Links: |
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| doi: |
10.1109/TPS.2016.2604040 |
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| Förderinstitution / Projekttitel: |
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| PPN (Katalog-ID): |
OLC1987856902 |
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| LEADER | 01000caa a2200265 4500 | ||
|---|---|---|---|
| 001 | OLC1987856902 | ||
| 003 | DE-627 | ||
| 005 | 20230518114731.0 | ||
| 007 | tu | ||
| 008 | 170207s2016 xx ||||| 00| ||eng c | ||
| 024 | 7 | |a 10.1109/TPS.2016.2604040 |2 doi | |
| 028 | 5 | 2 | |a PQ20170301 |
| 035 | |a (DE-627)OLC1987856902 | ||
| 035 | |a (DE-599)GBVOLC1987856902 | ||
| 035 | |a (PRQ)c1580-2f9d64737615785322ada2bedc999a9436ab1a8c5f97dc92df537c38818869da0 | ||
| 035 | |a (KEY)0058744320160000044001203379catalyticoxidationofdimethylsulfideovercommercialv | ||
| 040 | |a DE-627 |b ger |c DE-627 |e rakwb | ||
| 041 | |a eng | ||
| 082 | 0 | 4 | |a 530 |q DNB |
| 084 | |a 33.80 |2 bkl | ||
| 100 | 1 | |a Zhu, Xinbo |e verfasserin |4 aut | |
| 245 | 1 | 0 | |a Catalytic Oxidation of Dimethyl Sulfide Over Commercial V-W/Ti Catalysts: Plasma Activation at Low Temperatures |
| 264 | 1 | |c 2016 | |
| 336 | |a Text |b txt |2 rdacontent | ||
| 337 | |a ohne Hilfsmittel zu benutzen |b n |2 rdamedia | ||
| 338 | |a Band |b nc |2 rdacarrier | ||
| 520 | |a This paper investigated the enhancement of plasma on dimethyl sulfide (DMS) removal over commercial V-W/Ti catalysts. The effects of catalyst composition, discharge power, and gas temperature on DMS removal in the plasma-based system were analyzed. The results showed that the V 0.9 -W/Ti catalyst exhibited the best performance toward DMS removal due to its highest reducibility among the employed samples. The introduction of plasma exhibited a synergistic effect on catalysts and significantly enhanced the removal of DMS over the studied temperature range, especially in high discharge power cases. The activation energy <inline-formula> <tex-math notation="LaTeX">E_{a} </tex-math></inline-formula> of DMS removal in the presence of plasma was dramatically reduced to less than 10% of the catalysis only case, indicating different DMS removal pathways in plasma-activated catalysis system. The reaction mechanisms of DMS were also discussed based on the reaction products. | ||
| 650 | 4 | |a Carbon compounds | |
| 650 | 4 | |a chemistry | |
| 650 | 4 | |a Temperature distribution | |
| 650 | 4 | |a Oxidation | |
| 650 | 4 | |a Plasma applications | |
| 650 | 4 | |a Discharges (electric) | |
| 650 | 4 | |a pollution control | |
| 650 | 4 | |a Catalysts | |
| 650 | 4 | |a Nutrient removal | |
| 650 | 4 | |a Plasma | |
| 650 | 4 | |a Catalytic oxidation | |
| 650 | 4 | |a Low temperature physics | |
| 650 | 4 | |a Catalysis | |
| 650 | 4 | |a Electric discharges | |
| 650 | 4 | |a Oxidation-reduction reaction | |
| 650 | 4 | |a Plasma physics | |
| 650 | 4 | |a Research | |
| 700 | 1 | |a Yang, Yang |4 oth | |
| 700 | 1 | |a Geng, Xuewei |4 oth | |
| 700 | 1 | |a Zheng, Chenghang |4 oth | |
| 700 | 1 | |a Zhou, Jinsong |4 oth | |
| 700 | 1 | |a Gao, Xiang |4 oth | |
| 700 | 1 | |a Luo, Zhongyang |4 oth | |
| 700 | 1 | |a Ni, Mingjiang |4 oth | |
| 700 | 1 | |a Cen, Kefa |4 oth | |
| 773 | 0 | 8 | |i Enthalten in |t IEEE transactions on plasma science |d New York, NY : IEEE, 1973 |g 44(2016), 12, Seite 3379-3385 |w (DE-627)129391379 |w (DE-600)184848-3 |w (DE-576)014776553 |x 0093-3813 |7 nnns |
| 773 | 1 | 8 | |g volume:44 |g year:2016 |g number:12 |g pages:3379-3385 |
| 856 | 4 | 1 | |u http://dx.doi.org/10.1109/TPS.2016.2604040 |3 Volltext |
| 856 | 4 | 2 | |u http://ieeexplore.ieee.org/document/7762677 |
| 912 | |a GBV_USEFLAG_A | ||
| 912 | |a SYSFLAG_A | ||
| 912 | |a GBV_OLC | ||
| 912 | |a SSG-OLC-PHY | ||
| 912 | |a SSG-OLC-PHA | ||
| 912 | |a SSG-OLC-DE-84 | ||
| 912 | |a GBV_ILN_70 | ||
| 936 | b | k | |a 33.80 |q AVZ |
| 951 | |a AR | ||
| 952 | |d 44 |j 2016 |e 12 |h 3379-3385 | ||