Direct Observation of Group-V Dopant Substitutional Defects in CdTe Single Crystals
Point defect chemistry strongly affects the fundamental properties of materials and has a decisive impact on device performance. The Group-V dopant is prominent acceptor species with high hole concentration in CdTe; however, its local atomic structure is still not clear owing to difficulties in definitive measurements and discrepancies between experimental observations and theoretical models. Herein, we report on direct observation of the local structure for the As dopant in CdTe single crystals by the X-ray fluorescence holography (XFH) technique, which is a powerful tool to visualize three-dimensional atomic configurations around a specific element. The XFH result shows the As substituting on both Cd (AsCd) and Te (AsTe) sites. Although AsTe has been well known as a shallow acceptor, AsCd has not attracted much attention and been discussed so far. Our results provide new insights into point defects by expanding the experimental XFH study in combination with theoretical first-principles studies in II-VI semiconductors.
Medienart: |
E-Artikel |
---|
Erscheinungsjahr: |
2023 |
---|---|
Erschienen: |
2023 |
Enthalten in: |
Zur Gesamtaufnahme - volume:145 |
---|---|
Enthalten in: |
Journal of the American Chemical Society - 145(2023), 16 vom: 26. Apr., Seite 9191-9197 |
Sprache: |
Englisch |
---|
Beteiligte Personen: |
Nagaoka, Akira [VerfasserIn] |
---|
Links: |
---|
Themen: |
---|
Anmerkungen: |
Date Completed 01.05.2023 Date Revised 01.05.2023 published: Print-Electronic Citation Status PubMed-not-MEDLINE |
---|
doi: |
10.1021/jacs.3c01248 |
---|
funding: |
|
---|---|
Förderinstitution / Projekttitel: |
|
PPN (Katalog-ID): |
NLM356288374 |
---|
LEADER | 01000naa a22002652 4500 | ||
---|---|---|---|
001 | NLM356288374 | ||
003 | DE-627 | ||
005 | 20231226070138.0 | ||
007 | cr uuu---uuuuu | ||
008 | 231226s2023 xx |||||o 00| ||eng c | ||
024 | 7 | |a 10.1021/jacs.3c01248 |2 doi | |
028 | 5 | 2 | |a pubmed24n1187.xml |
035 | |a (DE-627)NLM356288374 | ||
035 | |a (NLM)37125455 | ||
040 | |a DE-627 |b ger |c DE-627 |e rakwb | ||
041 | |a eng | ||
100 | 1 | |a Nagaoka, Akira |e verfasserin |4 aut | |
245 | 1 | 0 | |a Direct Observation of Group-V Dopant Substitutional Defects in CdTe Single Crystals |
264 | 1 | |c 2023 | |
336 | |a Text |b txt |2 rdacontent | ||
337 | |a ƒaComputermedien |b c |2 rdamedia | ||
338 | |a ƒa Online-Ressource |b cr |2 rdacarrier | ||
500 | |a Date Completed 01.05.2023 | ||
500 | |a Date Revised 01.05.2023 | ||
500 | |a published: Print-Electronic | ||
500 | |a Citation Status PubMed-not-MEDLINE | ||
520 | |a Point defect chemistry strongly affects the fundamental properties of materials and has a decisive impact on device performance. The Group-V dopant is prominent acceptor species with high hole concentration in CdTe; however, its local atomic structure is still not clear owing to difficulties in definitive measurements and discrepancies between experimental observations and theoretical models. Herein, we report on direct observation of the local structure for the As dopant in CdTe single crystals by the X-ray fluorescence holography (XFH) technique, which is a powerful tool to visualize three-dimensional atomic configurations around a specific element. The XFH result shows the As substituting on both Cd (AsCd) and Te (AsTe) sites. Although AsTe has been well known as a shallow acceptor, AsCd has not attracted much attention and been discussed so far. Our results provide new insights into point defects by expanding the experimental XFH study in combination with theoretical first-principles studies in II-VI semiconductors | ||
650 | 4 | |a Journal Article | |
700 | 1 | |a Kimura, Koji |e verfasserin |4 aut | |
700 | 1 | |a Ang, Artoni Kelvin R |e verfasserin |4 aut | |
700 | 1 | |a Takabayashi, Yasuhiro |e verfasserin |4 aut | |
700 | 1 | |a Yoshino, Kenji |e verfasserin |4 aut | |
700 | 1 | |a Sun, Qingde |e verfasserin |4 aut | |
700 | 1 | |a Dou, Baoying |e verfasserin |4 aut | |
700 | 1 | |a Wei, Su-Huai |e verfasserin |4 aut | |
700 | 1 | |a Hayashi, Koichi |e verfasserin |4 aut | |
700 | 1 | |a Nishioka, Kensuke |e verfasserin |4 aut | |
773 | 0 | 8 | |i Enthalten in |t Journal of the American Chemical Society |d 1945 |g 145(2023), 16 vom: 26. Apr., Seite 9191-9197 |w (DE-627)NLM00000569X |x 1520-5126 |7 nnns |
773 | 1 | 8 | |g volume:145 |g year:2023 |g number:16 |g day:26 |g month:04 |g pages:9191-9197 |
856 | 4 | 0 | |u http://dx.doi.org/10.1021/jacs.3c01248 |3 Volltext |
912 | |a GBV_USEFLAG_A | ||
912 | |a GBV_NLM | ||
951 | |a AR | ||
952 | |d 145 |j 2023 |e 16 |b 26 |c 04 |h 9191-9197 |