Investigation of the Effects of Pulse-Atomic Force Nanolithography Parameters on 2.5D Nanostructures' Morphology
In recent years, Atomic Force Microscope (AFM)-based nanolithography techniques have emerged as a very powerful approach for the machining of countless types of nanostructures. However, the conventional AFM-based nanolithography methods suffer from low efficiency, low rate of patterning, and high complexity of execution. In this frame, we first developed an easy and effective nanopatterning technique, termed Pulse-Atomic Force Lithography (P-AFL), with which we were able to pattern 2.5D nanogrooves on a thin polymer layer. Indeed, for the first time, we patterned nanogrooves with either constant or varying depth profiles, with sub-nanometre resolution, high accuracy, and reproducibility. In this paper, we present the results on the investigation of the effects of P-AFL parameters on 2.5D nanostructures' morphology. We considered three main P-AFL parameters, i.e., the pulse's amplitude (setpoint), the pulses' width, and the distance between the following indentations (step), and we patterned arrays of grooves after a precise and well-established variation of the aforementioned parameters. Optimizing the nanolithography process, in terms of patterning time and nanostructures quality, we realized unconventional shape nanostructures with high accuracy and fidelity. Finally, a scanning electron microscope was used to confirm that P-AFL does not induce any damage on AFM tips used to pattern the nanostructures.
| Medienart: |
E-Artikel |
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| Erscheinungsjahr: |
2022 |
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| Erschienen: |
2022 |
| Enthalten in: |
Zur Gesamtaufnahme - volume:12 |
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| Enthalten in: |
Nanomaterials (Basel, Switzerland) - 12(2022), 24 vom: 11. Dez. |
| Sprache: |
Englisch |
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| Beteiligte Personen: |
Pellegrino, Paolo [VerfasserIn] |
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| Links: |
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| Themen: |
AFM-based nanofabrication |
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| Anmerkungen: |
Date Revised 26.12.2022 published: Electronic Citation Status PubMed-not-MEDLINE |
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| doi: |
10.3390/nano12244421 |
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| funding: |
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| Förderinstitution / Projekttitel: |
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| PPN (Katalog-ID): |
NLM350697965 |
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| 500 | |a published: Electronic | ||
| 500 | |a Citation Status PubMed-not-MEDLINE | ||
| 520 | |a In recent years, Atomic Force Microscope (AFM)-based nanolithography techniques have emerged as a very powerful approach for the machining of countless types of nanostructures. However, the conventional AFM-based nanolithography methods suffer from low efficiency, low rate of patterning, and high complexity of execution. In this frame, we first developed an easy and effective nanopatterning technique, termed Pulse-Atomic Force Lithography (P-AFL), with which we were able to pattern 2.5D nanogrooves on a thin polymer layer. Indeed, for the first time, we patterned nanogrooves with either constant or varying depth profiles, with sub-nanometre resolution, high accuracy, and reproducibility. In this paper, we present the results on the investigation of the effects of P-AFL parameters on 2.5D nanostructures' morphology. We considered three main P-AFL parameters, i.e., the pulse's amplitude (setpoint), the pulses' width, and the distance between the following indentations (step), and we patterned arrays of grooves after a precise and well-established variation of the aforementioned parameters. Optimizing the nanolithography process, in terms of patterning time and nanostructures quality, we realized unconventional shape nanostructures with high accuracy and fidelity. Finally, a scanning electron microscope was used to confirm that P-AFL does not induce any damage on AFM tips used to pattern the nanostructures | ||
| 650 | 4 | |a Journal Article | |
| 650 | 4 | |a AFM-based nanofabrication | |
| 650 | 4 | |a atomic force microscopy | |
| 650 | 4 | |a atomic force-nanolithography | |
| 650 | 4 | |a pulse-atomic force nanolithography | |
| 700 | 1 | |a Farella, Isabella |e verfasserin |4 aut | |
| 700 | 1 | |a Cascione, Mariafrancesca |e verfasserin |4 aut | |
| 700 | 1 | |a De Matteis, Valeria |e verfasserin |4 aut | |
| 700 | 1 | |a Bramanti, Alessandro Paolo |e verfasserin |4 aut | |
| 700 | 1 | |a Della Torre, Antonio |e verfasserin |4 aut | |
| 700 | 1 | |a Quaranta, Fabio |e verfasserin |4 aut | |
| 700 | 1 | |a Rinaldi, Rosaria |e verfasserin |4 aut | |
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