A first principles study of p-type doping in two dimensional GaN
Similar to most semiconductors, low-dimensional GaN materials also have the problem of asymmetric doping, that is, it is quite difficult to form p-type conductivity compared to n-type conductivity. Here, we have discussed the geometry, structure, and electronic defect properties of a two-dimensional graphene-like gallium nitride (g-GaN) monolayer belonging to the group III-V compounds, doped with different elements (In, Mg, Zn) at the Ga site. Based on first principles calculations, we found that substituting Ga (low concentration impurities) with Mg would be a better choice for fabricating a p-type doping semiconductor under N-rich conditions, which is essential for understanding the properties of impurity defects and intrinsic defects in the g-GaN monolayer (using the "transfer to real state" model). Moreover, the g-GaN monolayer is dynamically stable and can remain stable even in high-temperature conditions. This research provides insight for increasing the hole concentration and preparing potential high-performance optoelectronic devices using low-dimensional GaN materials.
Medienart: |
E-Artikel |
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Erscheinungsjahr: |
2021 |
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Erschienen: |
2021 |
Enthalten in: |
Zur Gesamtaufnahme - volume:23 |
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Enthalten in: |
Physical chemistry chemical physics : PCCP - 23(2021), 37 vom: 29. Sept., Seite 20901-20908 |
Sprache: |
Englisch |
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Beteiligte Personen: |
Huang, Hongfu [VerfasserIn] |
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Anmerkungen: |
Date Revised 29.09.2021 published: Electronic Citation Status PubMed-not-MEDLINE |
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doi: |
10.1039/d1cp02904e |
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funding: |
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Förderinstitution / Projekttitel: |
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PPN (Katalog-ID): |
NLM330706314 |
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520 | |a Similar to most semiconductors, low-dimensional GaN materials also have the problem of asymmetric doping, that is, it is quite difficult to form p-type conductivity compared to n-type conductivity. Here, we have discussed the geometry, structure, and electronic defect properties of a two-dimensional graphene-like gallium nitride (g-GaN) monolayer belonging to the group III-V compounds, doped with different elements (In, Mg, Zn) at the Ga site. Based on first principles calculations, we found that substituting Ga (low concentration impurities) with Mg would be a better choice for fabricating a p-type doping semiconductor under N-rich conditions, which is essential for understanding the properties of impurity defects and intrinsic defects in the g-GaN monolayer (using the "transfer to real state" model). Moreover, the g-GaN monolayer is dynamically stable and can remain stable even in high-temperature conditions. This research provides insight for increasing the hole concentration and preparing potential high-performance optoelectronic devices using low-dimensional GaN materials | ||
650 | 4 | |a Journal Article | |
700 | 1 | |a Peng, Junhao |e verfasserin |4 aut | |
700 | 1 | |a Dong, Huafeng |e verfasserin |4 aut | |
700 | 1 | |a Huang, Le |e verfasserin |4 aut | |
700 | 1 | |a Wen, Minru |e verfasserin |4 aut | |
700 | 1 | |a Wu, Fugen |e verfasserin |4 aut | |
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