A first principles study of p-type doping in two dimensional GaN

Similar to most semiconductors, low-dimensional GaN materials also have the problem of asymmetric doping, that is, it is quite difficult to form p-type conductivity compared to n-type conductivity. Here, we have discussed the geometry, structure, and electronic defect properties of a two-dimensional graphene-like gallium nitride (g-GaN) monolayer belonging to the group III-V compounds, doped with different elements (In, Mg, Zn) at the Ga site. Based on first principles calculations, we found that substituting Ga (low concentration impurities) with Mg would be a better choice for fabricating a p-type doping semiconductor under N-rich conditions, which is essential for understanding the properties of impurity defects and intrinsic defects in the g-GaN monolayer (using the "transfer to real state" model). Moreover, the g-GaN monolayer is dynamically stable and can remain stable even in high-temperature conditions. This research provides insight for increasing the hole concentration and preparing potential high-performance optoelectronic devices using low-dimensional GaN materials.

Medienart:

E-Artikel

Erscheinungsjahr:

2021

Erschienen:

2021

Enthalten in:

Zur Gesamtaufnahme - volume:23

Enthalten in:

Physical chemistry chemical physics : PCCP - 23(2021), 37 vom: 29. Sept., Seite 20901-20908

Sprache:

Englisch

Beteiligte Personen:

Huang, Hongfu [VerfasserIn]
Peng, Junhao [VerfasserIn]
Dong, Huafeng [VerfasserIn]
Huang, Le [VerfasserIn]
Wen, Minru [VerfasserIn]
Wu, Fugen [VerfasserIn]

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Journal Article

Anmerkungen:

Date Revised 29.09.2021

published: Electronic

Citation Status PubMed-not-MEDLINE

doi:

10.1039/d1cp02904e

funding:

Förderinstitution / Projekttitel:

PPN (Katalog-ID):

NLM330706314