2-D nanometer thickness mapping applying a reduced bias soft X-ray NEXAFS approach
We present a 2-D mapping of a sample thickness with nanometer accuracy employing a compact arrangement of near-edge X-ray absorption fine structure (NEXAFS) technique. A NEXAFS spectrum coupled with a scanning system was used to generate a 2-D thickness map of the TiO2 sample (anatase form) deposited on the top of a SiN membrane. The thickness values were retrieved from the experimental data by applying different methods of data processing. In the paper, the detailed analysis of the data processing methods and the identified sources of the errors show that the proposed procedure based on averaging two imperfect estimates reduces the error caused by the uncontrolled bias of the measured signals. This procedure was termed as the average one. The estimates from the proposed average approach and the standard absorption-jump ratio in the absorption edge vicinity were compared with the direct results obtained by applying scanning electron microscopy (SEM). The experimental arrangement of the NEXAFS spectroscopy system, the data acquisition method, as well as the possible error sources, are presented and discussed in detail.
| Medienart: |
E-Artikel |
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| Erscheinungsjahr: |
2020 |
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| Erschienen: |
2020 |
| Enthalten in: |
Zur Gesamtaufnahme - volume:28 |
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| Enthalten in: |
Optics express - 28(2020), 15 vom: 20. Juli, Seite 22478-22489 |
| Sprache: |
Englisch |
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| Beteiligte Personen: |
Wachulak, Przemysław [VerfasserIn] |
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| Links: |
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| Anmerkungen: |
Date Revised 05.08.2020 published: Print Citation Status PubMed-not-MEDLINE |
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| doi: |
10.1364/OE.397808 |
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| funding: |
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| Förderinstitution / Projekttitel: |
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| PPN (Katalog-ID): |
NLM313277478 |
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| LEADER | 01000naa a22002652 4500 | ||
|---|---|---|---|
| 001 | NLM313277478 | ||
| 003 | DE-627 | ||
| 005 | 20231225150231.0 | ||
| 007 | cr uuu---uuuuu | ||
| 008 | 231225s2020 xx |||||o 00| ||eng c | ||
| 024 | 7 | |a 10.1364/OE.397808 |2 doi | |
| 028 | 5 | 2 | |a pubmed24n1044.xml |
| 035 | |a (DE-627)NLM313277478 | ||
| 035 | |a (NLM)32752507 | ||
| 040 | |a DE-627 |b ger |c DE-627 |e rakwb | ||
| 041 | |a eng | ||
| 100 | 1 | |a Wachulak, Przemysław |e verfasserin |4 aut | |
| 245 | 1 | 0 | |a 2-D nanometer thickness mapping applying a reduced bias soft X-ray NEXAFS approach |
| 264 | 1 | |c 2020 | |
| 336 | |a Text |b txt |2 rdacontent | ||
| 337 | |a ƒaComputermedien |b c |2 rdamedia | ||
| 338 | |a ƒa Online-Ressource |b cr |2 rdacarrier | ||
| 500 | |a Date Revised 05.08.2020 | ||
| 500 | |a published: Print | ||
| 500 | |a Citation Status PubMed-not-MEDLINE | ||
| 520 | |a We present a 2-D mapping of a sample thickness with nanometer accuracy employing a compact arrangement of near-edge X-ray absorption fine structure (NEXAFS) technique. A NEXAFS spectrum coupled with a scanning system was used to generate a 2-D thickness map of the TiO2 sample (anatase form) deposited on the top of a SiN membrane. The thickness values were retrieved from the experimental data by applying different methods of data processing. In the paper, the detailed analysis of the data processing methods and the identified sources of the errors show that the proposed procedure based on averaging two imperfect estimates reduces the error caused by the uncontrolled bias of the measured signals. This procedure was termed as the average one. The estimates from the proposed average approach and the standard absorption-jump ratio in the absorption edge vicinity were compared with the direct results obtained by applying scanning electron microscopy (SEM). The experimental arrangement of the NEXAFS spectroscopy system, the data acquisition method, as well as the possible error sources, are presented and discussed in detail | ||
| 650 | 4 | |a Journal Article | |
| 700 | 1 | |a Fok, Tomasz |e verfasserin |4 aut | |
| 700 | 1 | |a Janulewicz, Karol |e verfasserin |4 aut | |
| 700 | 1 | |a Kostecki, Jerzy |e verfasserin |4 aut | |
| 700 | 1 | |a Bartnik, Andrzej |e verfasserin |4 aut | |
| 700 | 1 | |a Węgrzyński, Łukasz |e verfasserin |4 aut | |
| 700 | 1 | |a Fiedorowicz, Henryk |e verfasserin |4 aut | |
| 773 | 0 | 8 | |i Enthalten in |t Optics express |d 1997 |g 28(2020), 15 vom: 20. Juli, Seite 22478-22489 |w (DE-627)NLM120955946 |x 1094-4087 |7 nnns |
| 773 | 1 | 8 | |g volume:28 |g year:2020 |g number:15 |g day:20 |g month:07 |g pages:22478-22489 |
| 856 | 4 | 0 | |u http://dx.doi.org/10.1364/OE.397808 |3 Volltext |
| 912 | |a GBV_USEFLAG_A | ||
| 912 | |a GBV_NLM | ||
| 951 | |a AR | ||
| 952 | |d 28 |j 2020 |e 15 |b 20 |c 07 |h 22478-22489 | ||