Optical Spectroscopy for High-Pressure Microwave Plasma Chemical Vapor Deposition of Diamond Films
Polycrystalline diamond growth by microwave plasma chemical vapor deposition (MPCVD) at high-pressure (34.5 kPa) was investigated. The CH₄/H₂/O₂plasma was detected online by optical emission spectroscopy (OES), and the spatial distribution of radicals in the CH₄/H₂/O₂plasma was studied. Raman spectroscopy was employed to analyze the properties of the diamond films deposited in different oxygen volume fraction. The uniformity of diamond films quality was researched. The results indicate that the spectrum intensities of C₂, CH and Hα decrease with the oxygen volume fraction increasing. While the intensity ratios of C₂, CH to Hα also reduced as a function of increasing oxygen volume fraction. It is shown that the decrease of the absolute concentration of carbon radicals is attributed to the rise volume fraction of oxygen, while the relative concentration of carbon radicals to hydrogen atom is also reducing, which depressing the growth rate but improving the quality of diamond film. Furthermore, the OH radicals, role of etching, its intensities increase with the increase of oxygen volume fraction. Indicated that the improvement of OH concentration is also beneficial to reduce the content of amorphous carbon in diamond films. The spectrum space diagnosis results show that under high deposition pressure the distribution of the radicals in the CH₄/H₂/O₂plasma is inhomogeneous, especially, that of radical C₂ gathered in the central region. And causing a rapid increase of non-diamond components in the central area, eventually enable the uneven distribution of diamond films quality.
| Medienart: |
Artikel |
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| Erscheinungsjahr: |
2015 |
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| Erschienen: |
2015 |
| Enthalten in: |
Zur Gesamtaufnahme - volume:35 |
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| Enthalten in: |
Guang pu xue yu guang pu fen xi = Guang pu - 35(2015), 11 vom: 01. Nov., Seite 3007-11 |
| Sprache: |
Chinesisch |
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| Beteiligte Personen: |
Cao, Wei [VerfasserIn] |
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| Themen: |
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| Anmerkungen: |
Date Completed 26.04.2016 Date Revised 16.03.2016 published: Print Citation Status PubMed-not-MEDLINE |
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| Förderinstitution / Projekttitel: |
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| PPN (Katalog-ID): |
NLM258439599 |
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| LEADER | 01000naa a22002652 4500 | ||
|---|---|---|---|
| 001 | NLM258439599 | ||
| 003 | DE-627 | ||
| 005 | 20231224185021.0 | ||
| 007 | tu | ||
| 008 | 231224s2015 xx ||||| 00| ||chi c | ||
| 028 | 5 | 2 | |a pubmed24n0861.xml |
| 035 | |a (DE-627)NLM258439599 | ||
| 035 | |a (NLM)26978897 | ||
| 040 | |a DE-627 |b ger |c DE-627 |e rakwb | ||
| 041 | |a chi | ||
| 100 | 1 | |a Cao, Wei |e verfasserin |4 aut | |
| 245 | 1 | 0 | |a Optical Spectroscopy for High-Pressure Microwave Plasma Chemical Vapor Deposition of Diamond Films |
| 264 | 1 | |c 2015 | |
| 336 | |a Text |b txt |2 rdacontent | ||
| 337 | |a ohne Hilfsmittel zu benutzen |b n |2 rdamedia | ||
| 338 | |a Band |b nc |2 rdacarrier | ||
| 500 | |a Date Completed 26.04.2016 | ||
| 500 | |a Date Revised 16.03.2016 | ||
| 500 | |a published: Print | ||
| 500 | |a Citation Status PubMed-not-MEDLINE | ||
| 520 | |a Polycrystalline diamond growth by microwave plasma chemical vapor deposition (MPCVD) at high-pressure (34.5 kPa) was investigated. The CH₄/H₂/O₂plasma was detected online by optical emission spectroscopy (OES), and the spatial distribution of radicals in the CH₄/H₂/O₂plasma was studied. Raman spectroscopy was employed to analyze the properties of the diamond films deposited in different oxygen volume fraction. The uniformity of diamond films quality was researched. The results indicate that the spectrum intensities of C₂, CH and Hα decrease with the oxygen volume fraction increasing. While the intensity ratios of C₂, CH to Hα also reduced as a function of increasing oxygen volume fraction. It is shown that the decrease of the absolute concentration of carbon radicals is attributed to the rise volume fraction of oxygen, while the relative concentration of carbon radicals to hydrogen atom is also reducing, which depressing the growth rate but improving the quality of diamond film. Furthermore, the OH radicals, role of etching, its intensities increase with the increase of oxygen volume fraction. Indicated that the improvement of OH concentration is also beneficial to reduce the content of amorphous carbon in diamond films. The spectrum space diagnosis results show that under high deposition pressure the distribution of the radicals in the CH₄/H₂/O₂plasma is inhomogeneous, especially, that of radical C₂ gathered in the central region. And causing a rapid increase of non-diamond components in the central area, eventually enable the uneven distribution of diamond films quality | ||
| 650 | 4 | |a English Abstract | |
| 650 | 4 | |a Journal Article | |
| 700 | 1 | |a Ma, Zhi-bin |e verfasserin |4 aut | |
| 773 | 0 | 8 | |i Enthalten in |t Guang pu xue yu guang pu fen xi = Guang pu |d 1997 |g 35(2015), 11 vom: 01. Nov., Seite 3007-11 |w (DE-627)NLM09368360X |x 1000-0593 |7 nnns |
| 773 | 1 | 8 | |g volume:35 |g year:2015 |g number:11 |g day:01 |g month:11 |g pages:3007-11 |
| 912 | |a GBV_USEFLAG_A | ||
| 912 | |a GBV_NLM | ||
| 951 | |a AR | ||
| 952 | |d 35 |j 2015 |e 11 |b 01 |c 11 |h 3007-11 | ||