Design and fabrication of a novel prism for micro-optical system
This study presents a special k-type (45°, 135°) microprism structure design for the lateral-type semiconductor laser of optical systems. This study combines front- and back-side inclined exposure technology to develop a k-type microprism structure and replaces the optical prism manufactured through traditional machine processing or injection molding with a new polymer (thick-film negative photoresists) micro-optical prism structure. To obtain the optimal structural surface roughness (12-15 nm at 400 μm×400 μm area), the percentage of polymer material loss caused by the solvent was controlled. This roughness level meets Blu-ray specifications (λ/10, λ=405 nm).
| Medienart: |
E-Artikel |
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| Erscheinungsjahr: |
2012 |
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| Erschienen: |
2012 |
| Enthalten in: |
Zur Gesamtaufnahme - volume:51 |
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| Enthalten in: |
Applied optics - 51(2012), 16 vom: 01. Juni, Seite 3558-63 |
| Sprache: |
Englisch |
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| Beteiligte Personen: |
Hung, Kuo-Yung [VerfasserIn] |
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| Themen: |
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| Anmerkungen: |
Date Completed 13.09.2012 Date Revised 23.10.2018 published: Print Citation Status PubMed-not-MEDLINE |
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| doi: |
10.1364/AO.51.003558 |
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| funding: |
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| Förderinstitution / Projekttitel: |
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| PPN (Katalog-ID): |
NLM218601514 |
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| 245 | 1 | 0 | |a Design and fabrication of a novel prism for micro-optical system |
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| 500 | |a Citation Status PubMed-not-MEDLINE | ||
| 520 | |a This study presents a special k-type (45°, 135°) microprism structure design for the lateral-type semiconductor laser of optical systems. This study combines front- and back-side inclined exposure technology to develop a k-type microprism structure and replaces the optical prism manufactured through traditional machine processing or injection molding with a new polymer (thick-film negative photoresists) micro-optical prism structure. To obtain the optimal structural surface roughness (12-15 nm at 400 μm×400 μm area), the percentage of polymer material loss caused by the solvent was controlled. This roughness level meets Blu-ray specifications (λ/10, λ=405 nm) | ||
| 650 | 4 | |a Journal Article | |
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| 700 | 1 | |a Tsai, Yi-Wei |e verfasserin |4 aut | |
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