Iron-Intercalated Zirconium Diselenide Thin Films from the Low-Pressure Chemical Vapor Deposition of [Fe(η5-C5H4Se)2Zr(η5-C5H5)2]2

Copyright © 2020 American Chemical Society..

Transition metal chalcogenide thin films of the type Fe x ZrSe2 have applications in electronic devices, but their use is limited by current synthetic techniques. Here, we demonstrate the synthesis and characterization of Fe-intercalated ZrSe2 thin films on quartz substrates using the low-pressure chemical vapor deposition of the single-source precursor [Fe(η5-C5H4Se)2Zr(η5-C5H5)2]2. Powder X-ray diffraction of the film scraping and subsequent Rietveld refinement of the data showed the successful synthesis of the Fe0.14ZrSe2 phase, along with secondary phases of FeSe and ZrO2. Upon intercalation, a small optical band gap enhancement (E g(direct) opt = 1.72 eV) is detected in comparison with that of the host material.

Medienart:

E-Artikel

Erscheinungsjahr:

2020

Erschienen:

2020

Enthalten in:

Zur Gesamtaufnahme - volume:5

Enthalten in:

ACS omega - 5(2020), 26 vom: 07. Juli, Seite 15799-15804

Sprache:

Englisch

Beteiligte Personen:

Sanchez-Perez, Clara [VerfasserIn]
Knapp, Caroline E [VerfasserIn]
Colman, Ross H [VerfasserIn]
Sotelo-Vazquez, Carlos [VerfasserIn]
Sathasivam, Sanjayan [VerfasserIn]
Oilunkaniemi, Raija [VerfasserIn]
Laitinen, Risto S [VerfasserIn]
Carmalt, Claire J [VerfasserIn]

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Date Revised 29.03.2024

published: Electronic-eCollection

Citation Status PubMed-not-MEDLINE

doi:

10.1021/acsomega.0c00413

funding:

Förderinstitution / Projekttitel:

PPN (Katalog-ID):

NLM312331029