Direct Color Printing with an Electron Beam

The direct patterning of colors using the bombardment of a focused beam of electrons onto a thin-film stack consisting of poly(methyl methacrylate) coated with a thin nickel film is demonstrated. This direct electron-beam color printing approach creates variations in the height of a Fabry-Perot (FP) cavity, resulting directly in a color print without the need for prepatterned substrates, distinct from some direct laser writing methods. Notably, the resolution of the color prints is defined by the electron beam. Height measurements with ∼5 nm accuracy through color image analysis of an electron-beam-patterned FP cavity were carried out. This technique also introduces a reflectance-based measurement of the point exposure function of a focused electron beam, aiding in rapid proximity effect corrections. In addition, the grayscale lithographic nature of this process was used to produce blazed gratings and could enable the fabrication of other 2.5D nanostructures with precise height control.

Medienart:

E-Artikel

Erscheinungsjahr:

2020

Erschienen:

2020

Enthalten in:

Zur Gesamtaufnahme - volume:20

Enthalten in:

Nano letters - 20(2020), 6 vom: 10. Juni, Seite 4422-4429

Sprache:

Englisch

Beteiligte Personen:

Daqiqeh Rezaei, Soroosh [VerfasserIn]
Ho, Jinfa [VerfasserIn]
Wang, Tao [VerfasserIn]
Ramakrishna, Seeram [VerfasserIn]
Yang, Joel K W [VerfasserIn]

Links:

Volltext

Themen:

2.5D nanostructures
Color printing
Direct-write nanofabrication
Electron-beam lithography
Journal Article
Optical grating

Anmerkungen:

Date Revised 30.09.2020

published: Print-Electronic

Citation Status PubMed-not-MEDLINE

doi:

10.1021/acs.nanolett.0c01191

funding:

Förderinstitution / Projekttitel:

PPN (Katalog-ID):

NLM30975237X